Ensights

What are the toughest challenges lithographer's face to reduce process variations?

Lithographer’s face the challenge to translate designs into reproducible patterns that meet their yield, parametric performance, and reliability goals. Success or failure relies heavily on the controls in place that limit process variation. Recognizing and addressing all the sources of lithography pattern variations can preoccupy lithographers.

Take a look back at our successes in the first quarter of 2019. A record quarter for liquid filtration and 50 patents granted, worldwide, are among a few of those accomplishments. We also continued our investment in emerging talent with our co-op program that we are expanding globally. Take a look at some of those co-ops and the other highlights from Q1.

Listen as Dr. Mark Puttock, senior director, advanced technology engagements, explains how the semiconductor industry is adapting to 3D NAND memory challenges. From extreme high aspect ratio (HAR) processing, and the need for new chemical precursors and coatings Dr. Puttock discusses what it takes to achieve critical purity and contamination requirements.

Today, Entegris recognizes a milestone event in the semiconductor industry.

We are inspired and motivated every day by the incredible women we have here at Entegris.

We are proud of our accomplishments in 2018 and we are looking ahead to what we can achieve in 2019.

Entegris is an advanced materials science company focused on transforming the way technology impacts people's daily lives. But what does that work look like and how does materials science play a role in today's technologies?