Science that is transforming lives and enabling the future
Technologies like AI, IoT, and virtual reality are changing the way people live across the globe. To achieve the performance for these technologies, manufacturers have adopted new, more complex chip designs. These changes have increased the demands on the materials used in all steps of semiconductor processing.
Q2 was full of celebrations with the Anniversary of Moore’s Law and Global Internet of Things (IoT) Day. Check out more of Q2’s highlights and join us as we continue to fuel the Fourth Industrial Revolution and travel down the road to “smart everything.”
Buyer beware Today’s fast-paced semiconductor manufacturing industry is dynamic, and competition is stronger than ever. To stay competitive, suppliers and manufacturers seek to reduce costs wherever possible. Be careful those cost saving initiatives do not lead to buying products that compromise safety and performance in semiconductor manufacturing.
Take a look at what we were up to during SEMICON West 2019. From our CEO's appointment as chairman of SEMI, to the launch of our interactive well-managed fab app, we had a busy couple of days.
The first year of our Engineering Leadership Development Program (ELDP) has been completed. ELDP is a rotational program that cultivates future technical leaders through investment in professional development for high-potential engineering graduates.
Setting the stage Logic devices are getting smaller, and the introduction of 3D architectures that use vertical fins and nanowires in their gate design introduce more complexity to the fabrication process. As technology nodes shrink beyond 10 nm, new materials are required in both FEOL and BEOL processes to enable performance, yield, reliability and cost.
What are the toughest challenges lithographer's face to reduce process variations?
Lithographer’s face the challenge to translate designs into reproducible patterns that meet their yield, parametric performance, and reliability goals. Success or failure relies heavily on the controls in place that limit process variation. Recognizing and addressing all the sources of lithography pattern variations can preoccupy lithographers.