What are the toughest challenges lithographer's face to reduce process variations?
We’re debunking the chemical filtration and purification myths to reduce wafer defects in lithography processes.
First introduced at the SPIE Advanced Lithography conference, Jennifer Braggin, senior applications technologist, described the various tools in use today across leading-edge and mainstream semiconductor manufacturing processes to reduce wafer defects. Solutions are emerging through collaborations among materials, toolmakers, fabs, and end-users to examine the impact of particles, metals, gels, and organics on the performance of the process.
Register here for the Lithographer’s Toolkit webinar on May 29 at 10 AM EST to join the conversation and optimize your contamination control plan.